ST0009 Хромовое (Cr) мишень для распыления

Chromium (Cr) Sputtering Target Description

The Chromium (Cr) Sputtering Target is engineered for efficient and reliable physical vapor deposition processes. Manufactured to a purity of ≥99%, this target is precisely fabricated to ensure optimal sputtering performance, uniform erosion, and extended operational life. Its high melting point and density contribute to excellent thermal stability and durability during continuous operation. Ideal for high-tech applications, the target is suitable for semiconductor devices, advanced display panels, and decorative surface treatments.

Chromium (Cr) Sputtering Target Applications

·         Semiconductor Fabrication: Essential for depositing conductive or barrier layers in microelectronic devices.

·         Display Technology: Used for thin film deposition in the production of advanced display panels.

·         Decorative Coatings: Provides uniform chromium layers for decorative and protective finishes.

·         Optical Coatings: Applied in the manufacturing of reflective and anti-reflective coatings.

·         Industrial Tooling: Enhances surface properties for wear and corrosion resistance in various industrial components.

Chromium (Cr) Sputtering Target Packing

Our Chromium (Cr) Sputtering Targets are carefully packaged to maintain product integrity throughout storage and delivery. Standard packaging options include vacuum-sealed packaging, with custom packaging solutions available upon request to meet specific handling and shipment requirements.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a material source used in physical vapor deposition processes to form thin films on substrates by bombarding the target surface with energetic particles.

Q: What are the primary applications of a chromium sputtering target?
A: It is primarily used for thin film deposition in semiconductor fabrication, display technology, decorative coatings, and optical components.

Q: What does DC sputtering mean in this context?
A: DC sputtering refers to the use of a direct current plasma to uniformly erode the target material, ensuring a consistent film deposition onto the substrate.

Q: Can the shape or size of the sputtering target be customized?
A: Yes, our Chromium (Cr) Sputtering Targets are available in standard discs or can be custom-made to meet specific dimensional and application requirements.

Q: How does the purity of the target affect sputtering performance?
A: A high purity (≥99%) target minimizes impurities during the deposition process, ensuring excellent film quality, uniformity, and overall performance in critical applications.