Снято с производства (Снято с производства) ST0097 Молибденово-титановые (Mo/Ti) мишени для напыления

Molybdenum Titanium (Mo/Ti) Sputtering Target Description

Molybdenum Titanium (Mo/Ti) Sputtering Target is specifically designed for cutting-edge thin-film deposition processes in industries such as microelectronics and photovoltaics. Manufactured with a focus on precision and high purity, this target offers reliable performance and reproducible film quality, making it an essential component for high-performance sputtering systems. Its versatile design, available as discs or custom-made shapes, caters to diverse industrial requirements while ensuring consistency and durability in demanding environments.

Molybdenum Titanium (Mo/Ti) Sputtering Target Applications

· Semiconductor Manufacturing: Ideal for producing high-quality thin films in microelectronic devices.
· Photovoltaics: Used in the deposition of layers in solar cells to boost efficiency and durability.
· Optical Coatings: Provides excellent performance for anti-reflective and conductive coatings.
· Research and Development: Serves as a key material for experimental sputtering studies and process optimization.

Molybdenum Titanium (Mo/Ti) Sputtering Target Packing

Our Molybdenum Titanium (Mo/Ti) Sputtering Target is securely packaged to maintain its integrity during storage and transportation. Custom packaging options are available to suit specific shipment and handling requirements, ensuring that the product reaches you in pristine condition.

Frequently Asked Questions

Q: What are the main benefits of a Mo/Ti sputtering target compared to other materials?
A: The Mo/Ti composition provides a unique combination of high purity and tailored properties that ensure consistent thin-film quality and performance, particularly in demanding high-tech applications.

Q: In what forms is the sputtering target available?
A: The target is available as standard discs or can be custom-made according to your specific requirements.

Q: How does the purity level of ≥99% impact sputtering performance?
A: A high purity level minimizes contaminants, leading to better film uniformity and improved performance in critical applications such as microelectronics and optical coatings.

Q: Can the sputtering target be used in various sputtering systems?
A: Yes, the Mo/Ti sputtering target is engineered to be compatible with a wide range of sputtering systems, ensuring versatility across different manufacturing processes.

Q: What packaging options are available to ensure the target’s safe delivery?
A: We offer secure and custom packaging solutions designed to protect the target during transit and storage, ensuring it reaches your facility in optimal condition.