Целевое назначение: свинцовый титанат (PbTiO3) для магнитных пленок. Области применения включают пьезоэлектрические устройства, сегменты для магнитного резонанса, а также электрические и оптические применения. Свойства материала обеспечивают его применени

Lead Titanate (PbTiO3) Sputtering Target Description

The Lead Titanate (PbTiO3) Sputtering Target is engineered for the deposition of high-quality ferroelectric PbTiO3 thin films. Manufactured with a purity of ≥99% and a high melting point of ~1225℃, this target delivers excellent thermal stability and reliability during RF sputtering processes. Its density of ~7.5-8.0 g/cm³ and customizable disc or custom-made shapes make it versatile and adaptable for various deposition systems, ensuring uniform film characteristics and superior performance in demanding industrial applications.

Lead Titanate (PbTiO3) Sputtering Target Applications

· Thin Film Deposition: Ideal for fabricating ferroelectric films used in capacitors, memory devices, and sensors.
· Electronic Devices: Utilized in the production of advanced electronic components requiring precise film consistency.
· Optical Coatings: Applied to develop high-quality optical coatings with enhanced dielectric properties.
· Piezoelectric Applications: Supports the manufacturing of components in piezoelectric sensors and actuators.

Lead Titanate (PbTiO3) Sputtering Target Packing

Our Lead Titanate (PbTiO3) Sputtering Targets are carefully packaged to ensure integrity during storage and transportation. The products are vacuum-sealed and securely bundled, with packaging options tailored to meet customer-specific volume requirements.

Frequently Asked Questions

Q: What are the primary applications of PbTiO3 sputtering targets?
A: They are primarily used for depositing ferroelectric thin films in electronics, optics, and sensor devices.

Q: How is the high purity (≥99%) of the sputtering target achieved?
A: The purity is maintained through advanced purification and controlled manufacturing processes that minimize impurities.

Q: What advantages does RF sputtering offer for this target material?
A: RF sputtering enables uniform film deposition even on insulating materials like PbTiO3, ensuring consistent film quality.

Q: Can the shape of the sputtering target be customized?
A: Yes, the target is available in standard disc shapes or can be custom-made to suit specific deposition equipment requirements.

Q: Which industries benefit most from using Lead Titanate sputtering targets?
A: Industries such as electronics, optics, energy storage, and sensor manufacturing greatly benefit from the superior performance of these sputtering targets.