Снято с производства (Снято с производства) ST0514 Оксид гафния с оксидом кальция (HfO2/CaO) мишень для напыления

Hafnium Oxide with Calcium Oxide (HfO2/CaO) Sputtering Target Description

The Hafnium Oxide with Calcium Oxide (HfO2/CaO) Sputtering Target is designed for optimal performance in thin film deposition processes. Manufactured with stringent quality controls and a high purity of ≥99%, this sputtering target ensures consistent and reliable results in advanced industrial applications. Its customizable shapes allow for tailored solutions in a variety of modern manufacturing environments, making it a trusted choice for both research and production settings.

Hafnium Oxide with Calcium Oxide (HfO2/CaO) Sputtering Target Applications

· Semiconductor Device Manufacturing: Ideal for precise thin film deposition in microelectronic devices.
· Display Technologies: Used in the fabrication of high-resolution display panels.
· Photovoltaics: Supports advanced coating processes for solar cell production.
· Sensor Applications: Enhances the performance and durability of various sensor devices.
· Research and Development: Provides reliable results for experimental and prototype processes in academic and industrial labs.

Hafnium Oxide with Calcium Oxide (HfO2/CaO) Sputtering Target Packing

Customized packaging solutions ensure that the sputtering target is securely protected during storage and transportation. Packaging options are tailored based on client requirements to maintain product integrity from production to end-use.

Frequently Asked Questions

Q: What are the primary applications of the Hafnium Oxide with Calcium Oxide sputtering target?
A: It is primarily used in semiconductor device manufacturing, thin film deposition, display technologies, photovoltaics, and sensor applications.

Q: How is the high purity (≥99%) maintained in the production process?
A: The production process employs stringent quality control measures and advanced manufacturing techniques to ensure that the purity remains at or above 99%.

Q: What shapes are available for this sputtering target?
A: The target is typically available as discs, but custom-made shapes can be produced to meet specific industrial needs.

Q: Can the dimensions of the sputtering target be customized?
A: Yes, the available sizes are fully customizable to suit the unique requirements of different applications.

Q: What factors should be considered when selecting a sputtering target for advanced deposition processes?
A: Key considerations include material purity, composition stability, target shape, and compatibility with specific deposition system requirements.