Снято с производства (Снято с производства) ST0525 Титановые силицид (Ti5Si3) мишени для напыления

Titanium Silicide (Ti5Si3) Sputtering Target Description

The Titanium Silicide (Ti5Si3) Sputtering Target is manufactured using advanced techniques to achieve a purity level of ≥99%. Designed for precision sputtering processes, it offers consistent deposition performance and is available in discs or custom-made shapes to meet varied industrial requirements. This target is ideal for applications in semiconductor fabrication, thin film deposition, and other high-technology fields where material performance is critical.

Titanium Silicide (Ti5Si3) Sputtering Target Applications

· Thin Film Deposition: Essential for semiconductor device manufacturing and precise coating applications.
· Electronic Devices: Ideal for fabricating layers in microelectronic components and sensors.
· Research and Development: Provides high consistency and repeatability for experimental sputtering processes.
· Surface Coatings: Used to create advanced coatings with improved adhesion and durability on various substrates.

Titanium Silicide (Ti5Si3) Sputtering Target Packaging

Our Titanium Silicide (Ti5Si3) Sputtering Target is securely packaged to maintain its high purity and performance characteristics. Packaging options are customized to ensure safe transportation and storage according to client specifications.

Frequently Asked Questions

Q: What industries commonly use Titanium Silicide sputtering targets?
A: They are widely used in the semiconductor, electronics, and research industries for thin film deposition and surface coating applications.

Q: How does a purity level of ≥99% benefit sputtering processes?
A: High purity ensures consistent film quality, improved electrical characteristics, and enhanced reliability in the final product.

Q: Can the target be supplied in custom shapes and sizes?
A: Yes, the Titanium Silicide Sputtering Target is available in discs or custom-made shapes to meet specific user requirements.

Q: What deposition methods are ideal for using this target?
A: It is optimized for sputtering techniques and is compatible with standard sputtering equipment.

Q: How should the sputtering target be stored?
A: It should be stored in a controlled environment, free from moisture and contaminants, to maintain its purity and performance.