ST0880 Мишень для напыления, легированная танталом, цирконатом лития-лантана (Ta-doped LLZO)

Tantalum doped Lithium Lanthanum Zirconate Sputtering Target Description

The Tantalum doped Lithium Lanthanum Zirconate Sputtering Target is developed using advanced material processing techniques to ensure exceptional purity and consistency. The Ta-doped LLZO formulation offers enhanced ionic conductivity and excellent stability, making it an ideal candidate for precise thin film deposition. Its tailored design provides uniform performance under rigorous sputtering conditions, promoting superior film adhesion and microstructural control. This target is especially suited for fabricating high-quality components in microelectronics, energy storage devices, and other cutting-edge applications.

Tantalum doped Lithium Lanthanum Zirconate Sputtering Target Applications

· Thin Film Deposition: Ideal for creating uniform, high-quality films in semiconductor and microelectronic manufacturing.
· Solid-State Batteries: Utilized in the production of solid electrolytes for high-performance battery technologies.
· Advanced Coatings: Employed in coating applications that demand excellent chemical stability and film integrity.
· Research and Development: A valuable material for experimental studies in material science and nanotechnology.

Tantalum doped Lithium Lanthanum Zirconate Sputtering Target Packing

Our sputtering targets are carefully packaged to ensure product integrity during storage and transportation. Each order is custom-packed to meet customer specifications, with options for vacuum-sealed packaging to maintain purity and performance.

Frequently Asked Questions

Q: What makes Ta-doped LLZO different from standard LLZO?
A: The addition of tantalum improves the ionic conductivity and enhances the stability of the base material, making it particularly well-suited for demanding thin film deposition and solid-state battery applications.

Q: In which applications can this sputtering target be used?
A: It is ideal for thin film deposition in semiconductor manufacturing, solid electrolyte formation in batteries, advanced coating applications, and research-based material innovations.

Q: Are custom shapes available for this sputtering target?
A: Yes, the product is available in standard disc form or can be custom-made to specific dimensions as required by your application.

Q: How does the purity level of ≥99% impact performance?
A: A high purity level minimizes impurities that could interfere with the sputtering process, ensuring consistent film quality and better performance in sensitive electronics and energy storage devices.

Q: What are the recommended storage and handling procedures?
A: It is recommended to store the sputtering target in a clean, dry environment and utilize vacuum-sealed or similarly protective packaging during transportation to prevent contamination.